Si nanorods enhanced anisotropic wetting on compact disk surface
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Engineering and controlling surface anisotropic wettability and liquid spreading on patterned surfaces is an active area of research, which is of significant interest for a broad range of applications. Here, we report that nano-microstructured hybrid thin films, composed of an array of Si nanorods growing onto the compact disk Surface by means of oblique angle deposition, demonstrate a significantly enhanced anisotropic wetting behavior. The surface wetting anisotropy is characterized by the increase of the watermark aspect ratio from 1.17 to 4.57. Furthermore, resort to HFTS treatment, an anisotropic wetting study on the compact disk surface was carried out from both hydrophobic and hydrophilic perspectives. Both the hydrophilic and hydrophobic anisotropic wettings are interpreted by the Cassie’s law and Wenzel’s law. And coupled with a qualitative interpretation in a thermodynamic view, our models fittingly describe the nanostructure’s anisotropic wetting behavior as functions of measureable surface morphology parameters.